本书详细介绍了涉及薄膜材料科学的各个方面，内容包括真空技术、薄膜沉积技术与原子过程、薄膜的结构与性能表征等。本书内容广泛，资料全面，各章后面附有习题，是一本真正意义上的薄膜科学与技术的教科书。该书自1992 年第1版问市以来，深受材料科学界的广泛欢迎。非常适用于从事薄膜材料研究的专业研究人员、材料类院系高年级本科生和研究生作教材或参考书。本书由中国科学院物理研究所研究员曹则贤先生特别**。

ForewordtoFirstEdition
Preface
Acknowledgments
AHistoricalPerspective
Chapter1 AReviewofMaterialsScience
1.1 Introduction
1.2 Structure
1.3 DefectsinSolids
1.4 BondsandBandsinMaterials
1.5 ThermodynamicsofMaterials
1.6 Kinetics
1.7 Nucleation
1.8 AnIntroductiontoMechanicalBehavior
1.9 Conclusion
Exercises
References
Chapter2 VacuumScienceandTechnology
2.1 Introduction
2.2 KineticTheoryofGases
2.3 GasTransportandPumping
2.4 VacuumPumps
2.5 VacuumSystems
2.6 Conclusion
Exercises
References
Chapter3 Thin-FilmEvaporationProcesses
3.1 Introduction
3.2 ThePhysicsandChemistryofEvaporation
3.3 FilmThicknessUniformityandPurity
3.4 EvaporationHardware
3.5 EvaporationProcessesandApplications
3.6 Conclusion
Exercises
References
Chapter4 Discharges,Plasmas,andIon-SurfaceInteractions
4.1 Introduction
4.2 Plasmas,Discharges,andArcs
4.3 FundamentalsofPlasmaPhysics
4.4 ReactionsinPlasmas
4.5 PhysicsofSputtering
4.6 IonBombardmentModificationofGrowingFilms
4.7 Conclusion
Exercises
References
Chapter5 PlasmaandIonBeamProcessingofThinFilms
5.1 Introduction
5.2 DC,AC,andReactiveSputteringProcesses
5.3 MagnetronSputtering
5.4 PlasmaEtching
5.5 HybridandModifiedPVDProcesses
5.6 Conclusion
Exercises
References
Chapter6 ChemicalVaporDeposition
6.1 Introduction
6.2 ReactionTypes
6.3 ThermodynamicsofCVD
6.4 GasTransport
6.5 FilmGrowthKinetics
6.6 ThermalCVDProcesses
6.7 Plasma-EnhancedCVDProcesses
6.8 SomeCVDMaterialsIssues
6.9 Safety
6.10 Conclusion
Exercises
References
Chapter7 SubstrateSurfacesandThin-FilmNucleation
7.1 Introduction
7.2 AnAtomicViewofSubstrateSurfaces
7.3 ThermodynamicAspectsofNucleation
7.4 KineticProcessesinNucleationandGrowth
7.5 ExperimentalStudiesofNucleationandGrowth
7.6 Conclusion
Exercises
References
Chapter8 Epitaxy
8.1 Introduction
8.2 ManifestationsofEpitaxy
8.3 LatticeMisfitandDefectsinEpitaxialFilms
8.4 EpitaxyofCompoundSemiconductors
8.5 High-TemperatureMethodsforDepositingEpitaxialSemiconductorFilms
8.6 Low-TemperatureMethodsforDepositingEpitaxialSemiconductorFilms
8.7 MechanismsandCharacterizationofEpitaxialFilmGrowth
8.8 Conclusion
Exercises
References
Chapter9 FilmStructure
9.1 Introduction
……
Chapter10 CharacterizationofThinFilmsandSurfaces
Chapter11 Interdiffusion,Reactions,andTransformationsinThinFilms
Chapter12 MechanicalPropertiesofThinFilms
Index